Atomera Incorporated announced that Robert J. Mears, Chief Technology Officer and Founder, will deliver an in-person presentation titled 'Applications of Oxygen Inserted Epitaxy' at PRiME 2024. The presentation is scheduled for Friday, October 11, 2024, in Honolulu, HI. This session will explore significant innovations in semiconductor materials, emphasizing how OI silicon has evolved to support cutting-edge nanosheet and power devices.
The invited talk will discuss how Oxygen Inserted (OI) epitaxy, a class of Atomera’s Mears Silicon Technology (MST) film, enables interface engineering to increase mobility in Gate All Around transistors. It will also cover dopant profile engineering for power electronics, RFSOI, and traditional logic transistors. Attendees will gain insights into OI silicon devices, their fundamental characterization, and the electrical and physical benefits they offer across various semiconductor applications.
MST is designed to enhance CMOS-type transistors, making them smaller, faster, more reliable, and significantly more power-efficient. The technology's ability to deliver quantifiable performance improvements is critical in an industry constantly seeking breakthroughs. This presentation underscores Atomera's ongoing commitment to advancing semiconductor materials engineering.
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