Atomera Incorporated announced that Robert Mears, CTO and founder, will present at The Incize RF Workshop 2025: Shaping the Future of RF Technology. The presentation, titled 'Extending the Performance of RF-SOI Devices Through Oxygen Inserted (OI) Epitaxy,' is scheduled for Friday, April 4, 2025. This highlights Atomera's focus on advancing radio-frequency semiconductor solutions.
The session will delve into how Atomera’s Mears Silicon Technology (MST) OI technology enhances mobility, reduces power handling issues, and optimizes performance of RF-SOI switches. It also enables co-optimization of Low-Noise Amplifier (LNA) devices, which are critical for 5G and future 6G technologies. This innovative approach to dopant engineering allows for superior RF performance.
Atomera will also highlight its ongoing collaboration with Soitec to enable MST on RF-SOI substrates. This partnership aims to facilitate faster adoption and scaling for production volumes of MST-enhanced RF-SOI devices. The advancements are designed to meet the increasing demands for power efficiency and performance in next-generation wireless applications.
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