Veeco Instruments Inc. announced that the University of Michigan published a breakthrough study on atomic layer deposition (ALD) of molybdenum disulfide (MoS2) using Veeco's Fiji G2 plasma enhanced ALD (PEALD) system. The research demonstrated a novel synthesis route using di-tert-butyl disulfide (TBDS) as a safer replacement for hydrogen sulfide (H2S).
The study, published in Chemistry of Materials Journal, showed that using TBDS liquid provides comparable film characteristics to traditional H2S-based growth. This method significantly reduces hazards and eliminates the need for expensive safety measures associated with H2S use, addressing key challenges in 2D material adoption.
This development is an important step for the large-scale integration of 2D transition metal di-chalcogenides into commercial devices. The University of Michigan is commissioning a second Fiji system, which will be its third, to support further research activities, indicating strong confidence in Veeco's ALD technology.
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